| 发明名称 |
LITHOGRAPHY SYSTEM AND DEVICE MANUFACTURING METHOD |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface cleaning method which can remove contaminants quickly and effectively for a lithography projection system. SOLUTION: A radical beam 7 is generated with a downstream radical beam source 10 to remove contaminants from a surface 8. COPYRIGHT: (C)2004,JPO&NCIPI
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| 申请公布号 |
JP2004200686(A) |
申请公布日期 |
2004.07.15 |
| 申请号 |
JP20030414495 |
申请日期 |
2003.12.12 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
VAN BEEK MICHAEL CORNELIS;BAKKER LEVINUS PIETER;BISSCHOPS THEODORUS HUBERTUS JOSEPHUS;JONKERS JEROEN;KROON MARK;WOLTERS ROBERTUS ADRIANUS MARIA;MAAS ADRIANUS JOHANNES HENRICUS |
| 分类号 |
H01L21/027;B08B7/00;G03F7/20;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
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