| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus to expose the both surfaces or one surface of a strip-type or sheet-type work through the pattern of a mask. SOLUTION: The apparatus is provided with a proximity exposure part and a contact exposure part opposing to each other and has a mask holder for contact exposure as attachable and detachable in the contact exposure part. Specifically, a mount base for a mask/mask alignment mechanism is disposed above the XYθdriving mechanism for mask/work alignment fixed to a base frame, while a table is disposed via the XYθdriving mechanism for mask/mask alignment above the mount base of the mask/mask alignment mechanism. A guide member formed on the lower face of a contact exposure mask holder in the contact exposure part is detachably engaged with a guide formed on the upper face of a supporting column fixed on the table. COPYRIGHT: (C)2004,JPO&NCIPI
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