发明名称 MICROWAVE PLASMA GENERATION DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a microwave plasma generation device directly exciting gas in a vacuum vessel by evanescent wave from a microwave resonator arranged in the vacuum vessel, without using ECR method. <P>SOLUTION: The microwave plasma generation device comprises a microwave source for generating excitation microwave, a plasma gas source, the vacuum vessel 1 to which gas is supplied from the plasma gas source, a coaxial waveguide tube 3 for guiding excitation microwave into the container, and a parallel flat plate launcher 2 arranged in the container 1. The parallel flat plate launcher 2 has a resonance cavity formed of a first conductor plate 21 connected to an outer conductor plate 31 of the coaxial waveguide tube 3, a dielectric plate 23, and a second conductor plate 22 having a plurality of holes, connected to the coaxial waveguide tube 31 for releasing evanescent microwave into the vacuum vessel 1. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004200113(A) 申请公布日期 2004.07.15
申请号 JP20020369983 申请日期 2002.12.20
申请人 HAMAMATSU KAGAKU GIJUTSU KENKYU SHINKOKAI 发明人 NAGATSU MASAAKI
分类号 H05H1/46;C23C16/511;H01J37/32;H01L21/3065;H01L21/31 主分类号 H05H1/46
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