发明名称 |
Processing apparatus including a reactor for electrochemically etching microelectronic workpiece |
摘要 |
Although there are several inventions disclosed herein, the present application is directed to a reactor for electrochemically processing a microelectronic workpiece. The reactor comprises a movable electrode assembly that is disposed for movement along a motion path. The motion path includes at least a portion thereof over which the electrode assembly is positioned for processing at least one surface of the microelectronic workpiece. A cleaning electrode is located along the motion path of the movable electrode assembly. In one embodiment, a programmable controller is connected to direct the movable electrode assembly to move to the cleaning electrode during a cleaning cycle. At that time, the programmable controller connects the movable electrode assembly as an anode and the cleaning electrode as a cathode for cleaning of the movable electrode assembly. The cleaning electrode may be disposed along a position of the motion path that is beyond the range of motion required to process the microelectronic workpiece so that the programmable controller may be programmed to conduct a cleaning cycle while a microelectronic workpiece is present in the reactor for processing.
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申请公布号 |
US2004134774(A1) |
申请公布日期 |
2004.07.15 |
申请号 |
US20030745190 |
申请日期 |
2003.12.23 |
申请人 |
WOODRUFF DANIEL;EUDY STEVE;ERICKSON JAMES;OBERLITNER THOMAS;EGLOFF MATTHEW |
发明人 |
WOODRUFF DANIEL;EUDY STEVE;ERICKSON JAMES;OBERLITNER THOMAS;EGLOFF MATTHEW |
分类号 |
C25D5/00;C25D7/00;C25D7/12;C25D17/00;C25D21/10;H01L21/00;(IPC1-7):C25D17/00 |
主分类号 |
C25D5/00 |
代理机构 |
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代理人 |
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主权项 |
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