Making photo-masks for integrated circuits, pre-structures multi-layer coating on substrate surface to form reflected regions outside trench and non-reflective regions inside it

摘要

Pre-structuring of the multi-layer coating (10, 70) on the substrate surface (1), forms a reflective region (R) outside the trench (55) and a non-reflective region (NR) in the trench. An Independent claim is included for the corresponding photo-mask for an integrated circuit.