发明名称 |
SENSOR SYSTEM AND METHODS USED TO DETECT MATERIAL WEAR AND SURFACE DETERIORATION |
摘要 |
A sensor system has been developed for measuring erosion of a sputtering target (510) in a vacuum chamber that includes: a) a sputtering target, b) a wafer, c) a vacuum atmosphere located between the sputtering target and the wafer, and d) a sensor device (525) directly coupled to the sputtering target (510), wherein the sensor device (525) is exposed to the vacuum atmosphere and comprises a data collection apparatus that is exposed to atmospheric pressure. A method of detecting erosion in a sputtering target (510) has also been developed that includes: a) providing a sputtering target (510), b) providing a wafer (550), c) initiating a vacuum atmosphere and a plasma that are located between the sputtering target (510) and the wafer (550), d) providing a sensor device (525) directly coupled to the sputtering target (510), wherein the sensor device (525) is partly exposed to the vacuum atmosphere and comprises a data collection apparatus that is exposed to atmospheric pressure, e) collecting data from the data collection apparatus; and f) automatically terminating the operation of the plasma once the data collection apparatus determines that the sputtering target (510) has sufficiently eroded.
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申请公布号 |
WO2004024979(A9) |
申请公布日期 |
2004.07.15 |
申请号 |
WO2003US28832 |
申请日期 |
2003.09.12 |
申请人 |
HONEYWELL INTERNATIONAL INC.;BONNE, ULRICH;MOSHER, JOHN;POBLANO, PHILIP;GRABMEIER, SUSANNE;THOMAS, MICHAEL;STROTHERS, SUSAN |
发明人 |
BONNE, ULRICH;MOSHER, JOHN;POBLANO, PHILIP;GRABMEIER, SUSANNE;THOMAS, MICHAEL;STROTHERS, SUSAN |
分类号 |
C23C14/34;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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