Lithographieverfahren und Maske zu dessen Durchführung,申请号DE20005006747-传众专利搜索

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发明名称	Lithographieverfahren und Maske zu dessen Durchführung
摘要
申请公布号	DE50006747(D1)	申请公布日期	2004.07.15
申请号	DE20005006747	申请日期	2000.11.23
申请人	INFINEON TECHNOLOGIES AG	发明人	CZECH, GUENTHER;FRIEDRICH, CHRISTOPH;FUELBER, DR.;KAESMAIER, RAINER;WIDMANN, DR.
分类号	G03F1/14;(IPC1-7):G03F1/14	主分类号	G03F1/14
代理机构		代理人
主权项
地址

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