发明名称 |
Semiconductor substrate holder for epitaxial processes, has structure designed to equalize temperature over substrate placed on or near it |
摘要 |
The holder (1) has a temperature-equalization structure promoting a defined temperature profile over the entire surface of the substrate (2). The substrate lies on or near the holder during processing, which involves heating or cooling.
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申请公布号 |
DE10261362(A1) |
申请公布日期 |
2004.07.15 |
申请号 |
DE20021061362 |
申请日期 |
2002.12.30 |
申请人 |
OSRAM OPTO SEMICONDUCTORS GMBH |
发明人 |
WALTER, ALEXANDER;HAERLE, VOLKER;PETER, MATTHIAS;BADER, STEFAN |
分类号 |
C23C16/458;C30B25/12;(IPC1-7):C30B25/12;C23C14/50;C30B25/08;C30B33/02 |
主分类号 |
C23C16/458 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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