METHOD AND APPARATUS FOR PLASMA PROCESSING WITH PROCESSING UNIFORMITY AND ACCURATE SPEED CONTROL

摘要

PURPOSE: A method and an apparatus for plasma processing are provided to perform a uniform plasma processing in a straight line direction and to control a processing speed of the plasma processing accurately. CONSTITUTION: A plasma processing apparatus includes a plasma source(19), a gas supplying member, a voltage source, an illumination monitor(26), and an end point detector. The plasma source includes an electrode and generates a plasma on a portion of a surface of an object to be processed(17). The gas supplying member supplies a gas in the plasma source. The voltage source supplies power to the electrode or the object to be processed. The illumination monitor monitors an illumination magnitude of the plasma. The endpoint detector detects an end point of plasma processing based on a monitoring result of the illumination monitor.