发明名称 BASE FOR EXTERNAL PREPARATIONS FOR THE SKIN AND COSMETICS CONTAINING THE SAME
摘要 <p>A base material for an external preparation for skin containing an alkylene oxide derivative is new. A base material for an external preparation for skin containing an alkylene oxide derivative is new. The alkylene oxide derivative is represented by formula (I). R1>O-((AO)m(EO)n)-R2> (I) AO : 3-4C oxyalkylene group; EO : oxyethylene group; R1>, R2>H atom or 1-4C hydrocarbon group; and m, n : mole numbers between 1 and 70. The amount of the oxyethylene group is 20 - 80 wt% of the total amount of the oxyalkylene and the oxyethylene groups. The ratio of the amount of H atoms to the amount of the hydrocarbon groups in R1> and R2> is 0.15 or less.</p>
申请公布号 EP1437118(A1) 申请公布日期 2004.07.14
申请号 EP20020770221 申请日期 2002.09.27
申请人 SHISEIDO CO., LTD.;NOF CORPORATION 发明人 OHMORI, TAKASHI;KAKOKI, HIROYUKI;MIYAHARA, REIJI;NANBA, TOMIYUKI;NAKANE, TOSHIHIKO;MARUYAMA, KEI-ICHI;SAKODA, TAKESHI;YASUKOHCHI, TOHRU;TEZUKA, YOJI
分类号 A61K8/72;A61K8/39;A61K8/86;A61K8/90;A61Q19/00;(IPC1-7):A61K7/00;A61K9/08;A61K7/48;A61K47/32 主分类号 A61K8/72
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