发明名称 Cathode arc source with magnetic field generating means positioned above and below the cathode
摘要 A cathode arc source has means for generating first and second magnetic fields, of opposite or reverse direction to each other. The resultant magnetic field includes a null point between the target and the substrate, though close to the target. Field strength normal to the target is zero at the null point, and field strength lateral to the target is strong at the target surface, constraining movement of the arc spot and reducing the risk of migration off the target surface. A target is made by pressing graphite powder at elevated temperature and pressure in the absence of binding material. Both source and target contribute to reduced macroparticles in deposited films.
申请公布号 US6761805(B1) 申请公布日期 2004.07.13
申请号 US19990236113 申请日期 1999.01.25
申请人 FILPLAS VACUUM TECHNOLOGY PTE. LTD. 发明人 SHI XU;TAY BENG KANG;TAN HONG SIANG;FLYNN DAVID IAN
分类号 C23C14/35;C23C14/06;C23C14/32;C23C14/34;H01J27/14;H01J37/32;H01J37/34;(IPC1-7):H01J37/32;C23C14/00 主分类号 C23C14/35
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