发明名称 |
Organic film vapor deposition method and a scintillator panel |
摘要 |
Comprising a first step of supporting a substrate formed with a scintillator on at least three protrusions of a target-support element disposed on a vapor deposition table so as to keep a distance from said vapor deposition table; a second step of introducing said vapor deposition table having said substrate supported by said target-support element into a vapor deposition chamber of a CVD apparatus; and a third step of depositing an organic film by CVD method onto all surfaces of said substrate, provided with said. scintillator, introduced into said vapor deposition chamber.
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申请公布号 |
US6762420(B2) |
申请公布日期 |
2004.07.13 |
申请号 |
US20020218130 |
申请日期 |
2002.08.14 |
申请人 |
HAMAMATSU PHOTONICS K.K. |
发明人 |
HOMME TAKUYA;TAKABAYASHI TOSHIO;SATO HIROTO |
分类号 |
B05D7/24;C08L67/02;C23C16/00;C30B25/02;C30B29/12;C30B29/54;C30B33/00;G01T1/00;G01T1/20;G21K4/00;(IPC1-7):G01T1/20 |
主分类号 |
B05D7/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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