发明名称 |
Liquid crystal display device and fabrication method thereof |
摘要 |
The present invention provides a novel photolithography processes using photoresist pattern having at least two areas which has different thickness from each other for a fabrication method for a liquid crystal display device having reversed staggered and channel-etched type thin film transistors, reduce a number of photolithography processes required for whole of the fabrication process of the liquid crystal display device, and improve brightness of the liquid crystal display device. |
申请公布号 |
US6762802(B2) |
申请公布日期 |
2004.07.13 |
申请号 |
US20010851942 |
申请日期 |
2001.05.10 |
申请人 |
RENESAS TECHNOLOGY CORP. |
发明人 |
ONO KIKUO;NAKAYOSHI YOSHIAKI;OKE RYUTARO;KANEKO TOSHIKI |
分类号 |
G02F1/136;G02F1/1343;G02F1/1362;G02F1/1368;G09F9/30;H01L21/302;H01L21/3065;H01L21/336;H01L29/786;(IPC1-7):G02F1/136;G02F1/134 |
主分类号 |
G02F1/136 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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