发明名称
摘要 A dicing method for a micro electro mechanical system chip, in which a high yield and productivity of chips can be accomplished, resulting from preventing damage to microstructures during a dicing process by using a photoresist or filler. The dicing method comprises the steps of spraying a liquid photoresist as a protectant of microstructures on a wafer on which the microstructures are installed, and coating the whole surface of the wafer with the photoresist (first step); heat treating the coated wafer at a predetermined temperature for a certain time to remove residual water in the sprayed photoresist and to cure the sprayed photoresist (second step); dicing the heat treated wafer (third step); and removing the photoresist (fourth step).
申请公布号 KR100439511(B1) 申请公布日期 2004.07.09
申请号 KR20020038792 申请日期 2002.07.05
申请人 发明人
分类号 H01L21/78;B81C1/00 主分类号 H01L21/78
代理机构 代理人
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