发明名称 |
System and method for fabrication and replication of diffractive optical elements for maskless lithography |
摘要 |
A method is disclosed for forming an array of focusing elements for use in a lithography system. The method involves varying an exposure characteristic over an area to create a focusing element that varies in thickness in certain embodiments. In further embodiments, the method includes the steps of providing a first pattern via lithography in a substrate, depositing a conductive absorber material on the substrate, applying an electrical potential to at least a first portion of the conductive absorber material, leaving a second portion of the conductive material without the electrical potential, and etching the second portion of the conductive material to provide a first pattern on the substrate that is aligned with the first portion of the conductive absorber material.
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申请公布号 |
US2004131946(A1) |
申请公布日期 |
2004.07.08 |
申请号 |
US20030677173 |
申请日期 |
2003.10.02 |
申请人 |
GIL DARIO;HASTINGS JEFFREY T.;GOODBERLET JAMES G.;MENON RAJESH;CARTER DAVID J.;SMITH HENRY I. |
发明人 |
GIL DARIO;HASTINGS JEFFREY T.;GOODBERLET JAMES G.;MENON RAJESH;CARTER DAVID J.;SMITH HENRY I. |
分类号 |
G03F1/00;G03F7/00;G03F7/075;G03F7/20;G03H1/00;G21G5/00;(IPC1-7):G03F7/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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