MANUFACTURING METHOD FOR POLISHING PAD, POLISHING PAD AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a polyurethane foam for a polishing pad by adding a surfactant to one of components for forming polyurethane by two-pack type reaction under mechanical stirring to prepare a cellular dispersion and mixing the remaining reaction component to the dispersion and to adjust the density of the polyurethane foam more accurately to reduce the density irregularity between production lots in this manufacturing method.

SOLUTION: This manufacturing method for the polyurethane foam includes a cellular dispersion manufacturing process wherein a silicone type nonionic surfactant having no hydroxyl group is added to an isocyanate group-containing prepolymer being a first component and the resulting composition is stirred in the presence of a non-reactive gas by a stirrer 20 to disperse the non-reactive gas as fine gas bubbles to prepare the cellular dispersion 1, a mixing process for mixing a second component with the cellular dispersion 1 to prepare a curable cellular dispersion, a curing process and a cutting process. In the cellular dispersion manufacturing process, the height of the liquid level of the cellular dispersion is detected by a liquid level detector 32 to adjust the density of the polyurethane foam.

COPYRIGHT: (C)2004,JPO&NCIPI