发明名称 |
Catch-pin water support for process chamber |
摘要 |
A new and improved wafer support for supporting wafers in a process chamber such as an edge bead removal (EBR) chamber. The wafer support comprises multiple wafer support units each including a gripper block that engages an edge portion or bevel of the wafer. The gripper block is attached to an engaging and disengaging mechanism for selectively causing engagement of the gripper blocks with the wafer to support the wafer and disengagement of the gripper blocks from the wafer to release the wafer for removal of the wafer from the chamber. The gripper blocks contact little or none of the surface area on the patterned surface of the wafer to prevent or substantially reduce the formation of contact-induced defects on the wafer.
|
申请公布号 |
US2004131460(A1) |
申请公布日期 |
2004.07.08 |
申请号 |
US20030339691 |
申请日期 |
2003.01.08 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHENG HSI-KUEI;LIN CHUN-TSE;WANG TING-CHUN;LIN YU-KU;WANG YING-LANG |
分类号 |
H01L21/687;(IPC1-7):B25J15/00 |
主分类号 |
H01L21/687 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|