| 摘要 |
The conversion kit of the invention is intended for converting an existing photolithographic machine for treating semiconductor wafers of a predetermined size to a machine for treating semiconductor wafers of a larger size. This is achieved without changing the basic parameters, characteristics, and dimensions of the existing machine and without the need of purchasing an expensive new machine. The kit of the invention consists of the following main replaceable parts and units listed in the direction of movement of the wafer through the machine: a notch-orientation unit for preliminary alignment of a wafer with a predetermined position of the notch; a wafer floating support for supporting the wafer on air cushion; a mechanical arm for transferring wafers between the wafer floating support and a wafer chuck; a wafer chuck for holding and securing the wafer during alignment, e.g., by vacuum; a calibration plate unit with a moveable calibration plate required for setting a wafer at a precise distance from the mask surface and with precise parallelism relative thereto; an outlet tray for transfer of the treated wafer from the wafer chuck to a receiving cassette. Some kit components are standard parts and units commercially produced for the lithographic machine of the larger size or of the next generation. Other parts are slightly modified and resized.
|
