| 发明名称 |
COMPOSITIONS SUBSTRATE FOR REMOVING ETCHING RESIDUE AND USE THEREOF |
| 摘要 |
Compositions containing certain organic solvents and a fluorine source are capable of removing photoresist and etching residue. |
| 申请公布号 |
WO2004030038(A3) |
申请公布日期 |
2004.07.08 |
| 申请号 |
WO2003US30237 |
申请日期 |
2003.09.26 |
| 申请人 |
AIR PRODUCTS AND CHEMICALS, INC.;EGBE, MATTHEW |
发明人 |
EGBE, MATTHEW |
| 分类号 |
G03F7/42;H01L21/311 |
主分类号 |
G03F7/42 |
| 代理机构 |
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代理人 |
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| 主权项 |
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