| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a defect examining method of high accuracy corresponding to various kinds of defects. <P>SOLUTION: This defect examining method comprises acquiring a plurality of examined images by photographing an examined object under various optical conditioners (step S1), creating a plurality of examination frequency images by performing Fourier transform on the plurality of acquired examination images (step S2), processing the plurality of created examination frequency images as input signals by a neutral network (step S3), and determining whether the examined object is good or bad on the basis of an output signal of the neutral network (step S4). The defect can be examined with high accuracy corresponding various kinds of defects by representing the difference in shapes of an examined object surface caused by the difference in optical conditions, and performing the operation in the neutral network not on the basis of the image data relating to the plurality of examined images under various optical conditions, but on the basis of the examination frequency image data transformed into the examination frequency components by Fourier transform. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
