发明名称 LAYOUT DESIGN EQUIPMENT, LAYOUT DESIGN METHOD AND LAYOUT DESIGN PROGRAM FOR SEMICONDUCTOR ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a layout design method for reducing the load of the layout operation of a power transistor. SOLUTION: This layout design method comprises a process S200 for acquiring gate length L and full gate width W<SB>t</SB>of a power transistor, a process S202 for acquiring the gate width W of a transistor element and a process S204 for acquiring the number of columns N<SB>c</SB>and the number of lines N<SB>r</SB>of the transistor element, and for arranging the transistor element having the gate length L and the gate width W with the number of columns N<SB>c</SB>and the number of lines N<SB>r</SB>to execute the layout of the power transistor when the product of the gate width W, the number of columns N<SB>c</SB>and the number of lines N<SB>r</SB>is not less than full gate width W<SB>t</SB>. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004193385(A) 申请公布日期 2004.07.08
申请号 JP20020360382 申请日期 2002.12.12
申请人 SANYO ELECTRIC CO LTD 发明人 SHIMAMURA TETSUO
分类号 G06F17/50;H01L21/82;(IPC1-7):H01L21/82 主分类号 G06F17/50
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