| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron microscope endowed with functions of direct-image observation of a high throughput by defect inspection of a semiconductor wafer or the like and scanned image observation at a high resolution. SOLUTION: The electron microscope is composed of an electron gun, an electron-optical system consisting of a plurality of electron lenses capable of selectively irradiating primary electron beams generated from the electron gun on a sample either in a first finely focused state or a second wider-focus state, an electron beam deflecting means for moving an irradiation position of the primary electron beams on the sample, a secondary electron detection unit for detecting secondary beams generated from the sample as a result of irradiation of the primary electron beams on the sample, an image detecting unit, and a beam separator. The primary electron beams generated from the electron gun incident into the beam separator along an electron-optical axis always irradiate from the beam separator along the electron-optical axis, and the secondary electron beams generated from the sample and incident contrary to the primary electron beams can be selectively deflected in a first and a second directions away from the electron-optical axis. COPYRIGHT: (C)2004,JPO&NCIPI
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