发明名称 METHOD OF MEASURING FLATNESS, METHOD OF MEASURING ADSORPTION FORCE, AND ELECTROOPTIC PANEL FOR MEASUREMENT
摘要 PROBLEM TO BE SOLVED: To provide a method of measuring flatness which easily measures the flatness of an adsorption stage or the like, and an electrooptic panel for measurement used for the method. SOLUTION: The method of measuring flatness comprises a depositing process in which the electrooptic panel for measurement, which comprises an electrooptic substance filled between a pair of substrates, on an object to be measured which needs flatness and an evaluating process in which the flatness of the object to be measured is indirectly evaluated by color unevenness of the electrooptic panel. The electrooptic panel for measurement is deposited on the object to be measured by vacuum deposition or the like. When foreign substances are attached to the object to be measured, a gap between the substrates of the electrooptic panel for measurement attached to the region of the foreign substances becomes narrow to generate regions having a different gap between the substrates. This allows visual evaluation by color unevenness of the electrooptic panel for measurement on which foreign substances are present. When the object to be measured has flatness, color unevenness of the electrooptic panel for measurement does not occur. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004191141(A) 申请公布日期 2004.07.08
申请号 JP20020358383 申请日期 2002.12.10
申请人 SEIKO EPSON CORP 发明人 MOMOSE SHINYA
分类号 G01L1/04;G01B11/30;G02F1/13;(IPC1-7):G01B11/30 主分类号 G01L1/04
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