发明名称 FORMING METHOD FOR CRYSTALLINE THIN FILM
摘要 PROBLEM TO BE SOLVED: To control the position of a crystal grain at a high degree in a crystalline thin film obtained by scanning type melting recrystallization. SOLUTION: The crystal grain is grown preferentially from a specific region by forming the specific region to the thin film and using the specific region as the starting thin film by partially melting the partial region of the starting thin film, and by continuously moving the partially melted partial region and passing the partial region in the specific region, and the position of the crystal grain of the crystalline thin film is controlled. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004193263(A) 申请公布日期 2004.07.08
申请号 JP20020358162 申请日期 2002.12.10
申请人 CANON INC 发明人 KUMOMI HIDEYA
分类号 H01L21/205;H01L21/20;H01L21/336;H01L29/786;(IPC1-7):H01L21/20 主分类号 H01L21/205
代理机构 代理人
主权项
地址