| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material adaptable to laser exposure, having low fog, ensuring a small variation of sensitivity during raw sample preservation, and capable of providing an image optimum for a photomechanical process, and to provide a photomechanical process using the same. SOLUTION: In the heat developable photosensitive material having a silver halide, an organic silver salt and a reducing agent on a support, a polymer compound containing a structure represented by formula (1): R-NH<SB>2</SB>as a partial structure or prepared by polymerizing a monomer containing formula (1), and a compound represented by formula (2) are contained. COPYRIGHT: (C)2004,JPO&NCIPI
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