发明名称 POSITIVE PHOTOSENSITIVE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide an alkali-soluble positive photosensitive composition having sensitivity to laser light in IR wavelength region, and to provide a positive photosensitive composition which gives required and sufficient adhesiveness when applied under the conditions of 25 to 60% humidity in a working room without requiring a burning, which can be developed while keeping high sensitivity and producing no residue, which gives an extremely hard resist film with a sharp profile, and which is improved in scratch resistance for handling before development. <P>SOLUTION: The composition is formed by containing an alkali-soluble organic polymer substance having a phenolic hydroxyl group, a photothermal converting substance which absorbs IR rays from an image exposure light source to convert into heat, and a melamine/formaldehyde resin. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004191884(A) 申请公布日期 2004.07.08
申请号 JP20020363018 申请日期 2002.12.13
申请人 THINK LABORATORY CO LTD 发明人 SATO TSUTOMU
分类号 G03F7/004;G03F7/00;G03F7/032 主分类号 G03F7/004
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