发明名称 MEDAL WASHING AND POLISHING DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a medal washing and polishing device having a low cost mechanism which surely absorbs and removes water drops stuck to the front and back surfaces of medals after being washed and polished. <P>SOLUTION: This medal washing and polishing device comprises: a medal washing and polishing part 2 for which a fixed upper brush board 2a and a lower brush board 2d rotated by a motor 2g are arranged so as to face each other at the lower part of the medal falling port 1a of a cabinet 1; a coin aligning part 3 in which the projection 3g of the height same as or lower than the thickness of the medal is formed on the carrying surface of a carrying conveyor 3f and a brush roll 3j rotated oppositely to a carrying direction is pivotally supported at an upper part such that a brush bristle tip is at the almost same height as the thickness of the medal; and a medal water absorbing part 4 for which a pair of upper and lower water absorbing rollers 4b and 4d are pivotally supported in a press contact state. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p>
申请公布号 JP2004187816(A) 申请公布日期 2004.07.08
申请号 JP20020357450 申请日期 2002.12.10
申请人 JETTER CO LTD 发明人 OYA TAKATOSHI
分类号 A63F7/02;B08B1/02;B08B3/02;B08B7/04;B24B29/00;(IPC1-7):A63F7/02 主分类号 A63F7/02
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