发明名称 HEAT TREATMENT APPARATUS FOR RESIN PARTICLE AND HEAT TREATMENT METHOD
摘要 PROBLEM TO BE SOLVED: To provide a heat treatment apparatus for resin particles by hot blast by which resin particles having excellent circularity can be obtained. SOLUTION: The heat treatment apparatus for resin particles is equipped with a heat treatment tank to treat resin particles with hot blast, a hot blast supplying member to supply hot blast into the heat treatment tank, a resin particles supply member surrounding the hot blast supply member to supply the resin particles. An annular passage of hot blast is formed in the inside of the cylindrical hot blast supply member. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004191567(A) 申请公布日期 2004.07.08
申请号 JP20020358300 申请日期 2002.12.10
申请人 SEIKO EPSON CORP 发明人 NAKAMURA MASAHIDE
分类号 G03G9/087;(IPC1-7):G03G9/087 主分类号 G03G9/087
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