| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive and negative radiation sensitive composition excellent in resolution and storage stability as a chemically amplifying resist. <P>SOLUTION: The positive composition contains (A) an imidazole compound expressed by formula (1); (B) a radiation-sensitive acid generating agent; and (C) (a) a resin which is insoluble to or hardly soluble to alkali and protected by an acid dissociating group and which becomes soluble to alkali when the acid dissociating group is dissociated, or (b) an alkali-soluble resin and an alkali solubility control agent. The negative composition contains the above (A) and (B), and (D) an alkali-soluble resin and (E) a compound which crosslinks an alkali-soluble resin in the presence of an acid. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
