METHOD FOR DETECTING DEFECT IN MASK, COMPUTER PROGRAM, AND REFERENCE SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a method for detecting a defect in a mask by patterning a reference substrate by using the mask immediately after the mask is manufactured.

SOLUTION: The reference substrate is stored in a clean state while ICs are produced. When a defect is suspected in the mask, a substrate coated with a resist, namely, a test substrate is patterned by exposing through the mask. The patterns on the referential substrate and on the test substrate are compared to decide whether the mask has a defect or not. The position of the defect in the mask can be found by scanning a smaller region in the pattern.

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