发明名称 |
Molecular beam epitaxy equipment |
摘要 |
Kindly enter the following into the Official File: Epitaxy equipment including an epitaxy chamber under vacuum containing a substrate support and at least one cell under vacuum for evaporation of epitaxy material closed by a diaphragm having at least one opening and communicating with the epitaxy chamber by a connecting flange, and a mobile plate positioned opposite the diaphragm such that the distance of the plate from an exterior surface of the diaphragm is variable and has a section corresponding to a section of the diaphragm and a molecular beam is formed at the level of a zone surrounding the plate.
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申请公布号 |
US2004129216(A1) |
申请公布日期 |
2004.07.08 |
申请号 |
US20030722985 |
申请日期 |
2003.11.26 |
申请人 |
ADDON, A CORPORATION OF FRANCE |
发明人 |
BOUCHAIB PIERRE;STEMMELEN FRANCK |
分类号 |
C30B25/08;C30B23/02;C30B23/06;H01L21/203;(IPC1-7):C23C16/00 |
主分类号 |
C30B25/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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