发明名称 Molecular beam epitaxy equipment
摘要 Kindly enter the following into the Official File: Epitaxy equipment including an epitaxy chamber under vacuum containing a substrate support and at least one cell under vacuum for evaporation of epitaxy material closed by a diaphragm having at least one opening and communicating with the epitaxy chamber by a connecting flange, and a mobile plate positioned opposite the diaphragm such that the distance of the plate from an exterior surface of the diaphragm is variable and has a section corresponding to a section of the diaphragm and a molecular beam is formed at the level of a zone surrounding the plate.
申请公布号 US2004129216(A1) 申请公布日期 2004.07.08
申请号 US20030722985 申请日期 2003.11.26
申请人 ADDON, A CORPORATION OF FRANCE 发明人 BOUCHAIB PIERRE;STEMMELEN FRANCK
分类号 C30B25/08;C30B23/02;C30B23/06;H01L21/203;(IPC1-7):C23C16/00 主分类号 C30B25/08
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