发明名称 |
Chemical dilution system for semiconductor device processing system |
摘要 |
A dilution stage is adapted to supply a dilute chemistry to a semiconductor device processing apparatus. The dilution stage includes a first vessel adapted to store the chemistry after dilution and a second vessel adapted to store the chemistry prior to dilution. The dilution stage may also include a control mechanism which is adapted to selectively control flowing of the chemistry and a dilutant to the first vessel. The control mechanism may be operative to fill the second vessel with the chemistry, and to flow the dilutant to the first vessel via the second vessel.
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申请公布号 |
US2004130965(A1) |
申请公布日期 |
2004.07.08 |
申请号 |
US20030338249 |
申请日期 |
2003.01.06 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
ACHKIRE YOUNES;SVIRCHEVSKI JULIA;FRANKEL JONATHAN S.;LAM KIEN-BANG |
分类号 |
G05D11/13;H01L21/00;(IPC1-7):G05D11/04 |
主分类号 |
G05D11/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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