Determining characteristic layer parameters during a coating process in semiconductor manufacture, by separately guiding pyrometer radiation path and beam path of spectral-optical system

摘要

The method involves compensating for the wobble and/or rotation of the sample to be measured. The pyrometer radiation path and the beam path of a spectral-optical system are guided separately from each other. The separation of the beam signal for temperature measurement and the beam signal for spectral-optical measured is performed by blanking the emitted light. An Independent claim is included for an apparatus for determining characteristic layer parameters