发明名称 |
METHOD FOR FABRICATING IMAGE SENSOR |
摘要 |
PURPOSE: A method for fabricating an image sensor is provided to lessen a mechanical impact in a back surface polishing process by forming a lens protection layer on a micro lens of an image sensor, and to maximize the characteristic of the micro lens by eliminating the lens protection layer after the back surface polishing process. CONSTITUTION: An overcoating layer(213) is formed on a color filter(212). A micro lens(214) is formed in a predetermined position on the overcoating layer. A lens protection layer is formed to sufficiently cover the micro lens. A back surface polishing process is performed. The lens protection layer is eliminated.
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申请公布号 |
KR20040061098(A) |
申请公布日期 |
2004.07.07 |
申请号 |
KR20020086879 |
申请日期 |
2002.12.30 |
申请人 |
DONGBU ELECTRONICS CO., LTD. |
发明人 |
KWON, DAE HYEOK;LEE, JAE SEOK |
分类号 |
H01L27/14;H01L21/00;H01L27/146;H01L31/0232;H04N5/335;H04N5/369;(IPC1-7):H01L27/14 |
主分类号 |
H01L27/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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