RETICLE FOR ALIGNING WAFER AND ALIGNING METHOD THEREOF

摘要

PURPOSE: A reticle for aligning a wafer and an aligning method thereof are provided to reduce distortion of an alignment key and to improve alignment between the reticle and the wafer by reducing slop and side lobe of a wafer pattern using a non-transmission pattern and a partial transmission pattern of the alignment key. CONSTITUTION: A reticle includes a mask(2), partial transmission patterns(4) and non-transmission patterns(6). The mask is made of quartz. The partial transmission patterns are spaced apart from each other on the mask. The non-transmission pattern is formed on each partial transmission pattern. The width of the non-transmission pattern is smaller than that of the partial transmission pattern. The transmittancy of the partial transmission pattern is in the range of 6 to 15 %. The non-transmission pattern is made of one selected from Cr, Mo and Si.