MASK OF EXPOSURE EQUIPMENT USING SCAN METHOD

摘要

PURPOSE: A mask of exposure equipment using a scan method is provided to optimize the overlay accuracy in a process for printing a thin film pattern on a substrate by controlling the deviation of the scan direction. CONSTITUTION: A mask of exposure equipment using a scan method includes a mask body, one or more pattern regions, and an alignment key. The pattern regions(234) are formed on the mask body(232). The pattern region includes a plurality of total pitch keys(237), which are formed between each edge and edges of external sides vertical to the scan direction. The alignment key(233) is formed around the pattern region.