METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY

摘要

PURPOSE: A method for manufacturing an LCD(Liquid Crystal Display) is provided to form a uniform channel layer in the low temperature state when forming source/drain electrodes by using chromium. CONSTITUTION: A metal film is deposited on a transparent insulation substrate(100) and a photoresist is coated on the metal film. A gate electrode(101) and a gate bus line are formed by exposing, developing and etching the photoresist and the metal film through the first mask. A gate insulation film is coated on the insulation substrate(100) and then an amorphous silicon for forming a channel layer(115) and an n+ doped silicon layer for forming an ohmic contact layer are sequentially coated on the gate insulation film. An active region formed on a TFT(Thin Film Transistor) is etched by using the second mask. Chromium is coated on the entire surface of the insulation substrate(100) and then source/drain electrodes(116a,116b) are formed by exposing, developing and wet-etching through the third mask, thereby forming the TFT device of the LCD. When etching the ohmic contact layer and the channel layer(115), patterned photoresist(200) is coated on the source/drain electrodes(116a,116b) and a dry etching is performed at the low temperature.