METHOD FOR FORMING TEST PATTERN WITHIN MASK FOR BIAS

摘要

PURPOSE: A method for forming a test pattern within a mask for bias is provided to search previously a condition for obtaining proper bias by using only a designed module. CONSTITUTION: A white isolated line of a left side and a dense line of a right side are formed by using the same design. A unit reference cell is formed on a mask by using an inside left dense line and a right isolated line. The unit reference cell is formed with a unit block module. The unit reference cell has the difference as much as the arbitrary size. A mask forming process is performed to form a mask including the unit block modules by inserting each unit block module into each region having different pattern density. The dense line is formed by 1 to 1 pitch.