MAGNETRON SPUTTERING DEVICE

摘要

PURPOSE: A magnetron sputtering device is provided to achieve improved uniformity of the thin film deposited on a substrate by allowing for a uniformity of erosion of target. CONSTITUTION: A magnetron sputtering device comprises a chamber having an air inlet port and an air outlet port; a substrate support board(210) for supporting a substrate; a magnet having a size which is not smaller than the size of a target(250), wherein the magnet is arranged underneath the target; a driving shaft coupled to the bottom of the magnet; a driving unit(280) for driving the driving shaft in a vertical direction; and a control unit(290) for controlling the driving unit.