CATCHMENT DEVICE USED IN FACTORY OF SEMICONDUCTOR DEVICE

摘要

PURPOSE: A catchment device used in a factory of a semiconductor device is provided to prevent a secondary accident caused by a leakage by rapidly and stably treating the leakage of water or chemicals occurring in the factory of the semiconductor device. CONSTITUTION: An absorption hole(12) absorbs wafer and air in the atmosphere, installed in a side of the vertical surface of a circular main body(10). An inspection pipe(14) inspects the state of collected water in the wafer collecting unit(1), installed in a part of the lower part of the vertical surface of the main body as a type of a quadrangle whose right side is eliminated. An exhaust pipe(13) exhausts the inside water, installed in a part of the lower part of the vertical surface of the main body. A blocking layer(15) eliminates the remaining water distributed to the air separated from the absorbed water, installed over the inside of the main body. An outlet hole(16) is installed on the main body to exhaust the air separated from the blocking layer.