发明名称 PHOTOPOLYMERIZABLE COMPOSITION COMPRISING A SQUARYLIUM COMPOUND
摘要 The present invention relates to photopolymerizable compositions comprising an addition-polymerizable compound which has at least one ethylenically unsaturated double bond; a radical-producing agent and a squarylium compound represented by the formula (I): <IMG> The compositions are highly sensitive to visible and near infrared lights, particularly He-Ne laser, LED, diode laser, etc. having oscillation wavelengths in a wavelength region of 600 nm or more, and thus are useful as materials for holograms, PS plates for laser direct process, dry film resists, digital proofs. photosensitive microcapsules.
申请公布号 CA2118604(C) 申请公布日期 2004.07.06
申请号 CA19932118604 申请日期 1993.07.07
申请人 KYOWA HAKKO KOGYO CO., LTD. 发明人 YAMAOKA, TSUGUO;KOSEKI, KENICHI;OBARA, MITSUHARU;SHIMIZU, IKUO;ITO, YUKIYOSHI;KAWATO, HITOSHI
分类号 C08F2/50;C08F222/10;C09D4/06;G03F7/029;G03F7/031;(IPC1-7):C07D215/14;G03F7/027;C09B23/04 主分类号 C08F2/50
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