发明名称 |
PHOTOPOLYMERIZABLE COMPOSITION COMPRISING A SQUARYLIUM COMPOUND |
摘要 |
The present invention relates to photopolymerizable compositions comprising an addition-polymerizable compound which has at least one ethylenically unsaturated double bond; a radical-producing agent and a squarylium compound represented by the formula (I): <IMG> The compositions are highly sensitive to visible and near infrared lights, particularly He-Ne laser, LED, diode laser, etc. having oscillation wavelengths in a wavelength region of 600 nm or more, and thus are useful as materials for holograms, PS plates for laser direct process, dry film resists, digital proofs. photosensitive microcapsules.
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申请公布号 |
CA2118604(C) |
申请公布日期 |
2004.07.06 |
申请号 |
CA19932118604 |
申请日期 |
1993.07.07 |
申请人 |
KYOWA HAKKO KOGYO CO., LTD. |
发明人 |
YAMAOKA, TSUGUO;KOSEKI, KENICHI;OBARA, MITSUHARU;SHIMIZU, IKUO;ITO, YUKIYOSHI;KAWATO, HITOSHI |
分类号 |
C08F2/50;C08F222/10;C09D4/06;G03F7/029;G03F7/031;(IPC1-7):C07D215/14;G03F7/027;C09B23/04 |
主分类号 |
C08F2/50 |
代理机构 |
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