| 摘要 |
PURPOSE: A method for manufacturing an image sensor is provided to reduce alignment failure in stepper processing by forming a thin photoresist for a blue filter on an alignment key pattern. CONSTITUTION: The first alignment key pattern(31) is formed on a semiconductor substrate(30). An insulating layer(32) is formed on the resultant structure. The second alignment key pattern(33) is formed on the insulating layer to overlap the first alignment key pattern. A photoresist layer(35) with thin thickness for a blue color filter is coated on the resultant structure.
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