ION BEAM SCANNING APPARATUS FOR FORMING ALIGNMENT LAYER

摘要

PURPOSE: An ion beam scanning apparatus is provided to uniformly form an alignment layer on a substrate by improving the linearity of ion beams. CONSTITUTION: An ion beam scanning apparatus comprises a substrate arranged in a vacuum container(440) and tilted in a predetermined angle; an ion beam source(400) for generating ion beams all over the substrate; and a medium(470) interposed between the substrate and the ion beam source, and which has a cut-off portion(471) and a pass portion(472). The ion beam source includes an element for dissociating the injected gas into ion and electron; an element for extracting the ion in the form of beam; and an accelerating element for accelerating the extracted ion beam in such a manner that the extracted ion beam reaches the substrate.