METHOD FOR IMPROVING UNIFORMITY OF INTERLAYER DIELECTRIC USING DUMMY POLY

摘要

PURPOSE: A method is provided to improve global uniformity of an interlayer dielectric by using a dummy poly formed in a field region. CONSTITUTION: A semiconductor substrate defined by a field region(100) and an active region(104) is prepared. A dummy poly pattern(102) is formed in the field region corresponding to the density of a poly pattern in the active region. The width of the dummy poly pattern is a minimum gate length.