WAFER CLEANING APPARATUS

摘要

PURPOSE: A wafer cleaning apparatus is provided to remove effectively particles from a wafer by eroding the wafer using a predetermined voltage between a working electrode and a counter electrode. CONSTITUTION: A cleaning bath(100) stores chemical solutions. A wafer(120) is in the cleaning bath. A working electrode(110) is formed at an edge of the wafer. A reference electrode(115) is formed at the edge of the wafer near to the working electrode. A counter electrode(130) is installed opposite the working electrode in the cleaning bath. A measurement part(150) for measuring a reference voltage between the working electrode and the reference electrode is connected with the working electrode and the reference electrode. A power supply(140) is used for supplying a predetermined voltage to the wafer by using the working electrode and the counter electrode. The predetermined voltage is smaller than the reference voltage.