METHOD FOR MANUFACTURING CMOS IMAGE SENSOR FOR PREVENTING PEELING OF OVER COATING LAYER

摘要

PURPOSE: A method for manufacturing a CMOS image sensor is provided to prevent peeling of an OCL(Over Coating Layer) by using silylation processing. CONSTITUTION: A CFA(Color Filter Array)(26) is formed on a substrate(20) with a photodiode(22). An OCL(Over Coating Layer)(27) as a planarization layer is formed on the CFA. A silicon layer(28) is formed on the OCL by silylation processing using HMCTS(Hexa Methyl Cyclo Tri Silazane) or HMDS(Hexa Methyl Di Silazane).