发明名称 STENCIL MASK HAVING MICRO-PROCESSED OPENINGS AND MANUFACTURING METHOD THEREOF
摘要 PURPOSE: A stencil mask and manufacturing method thereof are provided to perform a micro-processing on openings in a thin film while maintaining strength of the stencil mask. CONSTITUTION: A stencil mask(1) includes a transfer mask(6) and a supporting member(4) formed on one face of the transfer mask. The transfer mask is configured by a plurality of thin films(2,5) stacked on one top of another, each of the thin films having a selectively formed first opening(7). The transfer mask has a second opening. The second opening in the transfer mask has dimensions smaller than those of the first opening in the thin film.
申请公布号 KR20040058085(A) 申请公布日期 2004.07.03
申请号 KR20030097297 申请日期 2003.12.26
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SHIBATA TAKESHI
分类号 G03F1/16;G03F1/20;H01L21/027;H01L21/266;H01L21/302;H01L21/461;(IPC1-7):H01L21/027 主分类号 G03F1/16
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