发明名称 PLATING APPARATUS, PLATING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 Problem: It has been desired to form a plurality of combinations of plating films continuously on a single transfer rail and to form a plating film having a high quality and a uniform thickness on the surfaces of a lead frame and leads. Solving means: The plating apparatus is provided below the single transfer rail with a plurality of plating tanks, in which plating solution baths are disposed. By moving the plating solution between the plating tanks and the plating solution baths, it is possible to select a plating film to be formed on a conductive member (21). As a result, it is possible to form combinations of plating films on the conductive member (21) continuously by the single transfer rail. <IMAGE>
申请公布号 KR20040058113(A) 申请公布日期 2004.07.03
申请号 KR20037014306 申请日期 2003.11.03
申请人 发明人
分类号 C25D7/12;C25D5/10;C25D17/28;C25D21/00;H01L23/495 主分类号 C25D7/12
代理机构 代理人
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