DISTURBANCE-FREE PLASMA PROCESSING/CONTROLLING SYSTEM AND METHOD

摘要

PURPOSE: Disturbance-free, recipe-controlled plasma processing/controlling system and method are provided to suppress inter-lot fluctuation, in-lot fluctuation and variance by using a feedback control or feedforward control applied on the basis of the outputs of sensors monitoring process parameters or on the basis of a measured result. CONSTITUTION: A plasma processing apparatus(23) performs a plasma processing operation over a sample accommodated within a vacuum processing chamber. A sensor(24) monitors process parameters during the processing operation. A processed-result estimation model member(25) estimates a processed result on the basis of a monitored output and a preset processed-result estimation equation. An optimum recipe calculation model member(26) calculates optimum processing conditions such that the processed result becomes a target value on the basis of the estimated result of the processed-result estimation model member. An usable recipe determiner judges validity of an optimum recipe. A controller for controls the plasma processing apparatus on the basis of the usable recipe determined by the usable recipe determiner.