发明名称 METHOD FOR MANUFACTURING CAPACITOR WITH STACKED DIELECTRIC FILM OF ALUMINA AND HAFNIUM OXIDE
摘要 PURPOSE: A method for manufacturing a capacitor with a stacked dielectric film of an alumina film and a hafnium oxide layer is provided to prevent oxidation of a lower electrode by reforming an aluminum film to the alumina. CONSTITUTION: A lower electrode(21) made of a polysilicon layer is prepared. An aluminum film is formed on the lower electrode. A hafnium oxide layer(23) is formed on the aluminum film. By sequentially performing plasma treatment of low-temperature and annealing of high-temperature, the aluminum film is reformed to an alumina(22a). Then, an upper electrode is formed on the hafnium oxide layer.
申请公布号 KR20040057751(A) 申请公布日期 2004.07.02
申请号 KR20020084545 申请日期 2002.12.26
申请人 HYNIX SEMICONDUCTOR INC. 发明人 KIM, GYEONG MIN;OH, HUN JEONG
分类号 H01L27/04;(IPC1-7):H01L27/04 主分类号 H01L27/04
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