发明名称 |
METHOD FOR MANUFACTURING CAPACITOR WITH STACKED DIELECTRIC FILM OF ALUMINA AND HAFNIUM OXIDE |
摘要 |
PURPOSE: A method for manufacturing a capacitor with a stacked dielectric film of an alumina film and a hafnium oxide layer is provided to prevent oxidation of a lower electrode by reforming an aluminum film to the alumina. CONSTITUTION: A lower electrode(21) made of a polysilicon layer is prepared. An aluminum film is formed on the lower electrode. A hafnium oxide layer(23) is formed on the aluminum film. By sequentially performing plasma treatment of low-temperature and annealing of high-temperature, the aluminum film is reformed to an alumina(22a). Then, an upper electrode is formed on the hafnium oxide layer.
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申请公布号 |
KR20040057751(A) |
申请公布日期 |
2004.07.02 |
申请号 |
KR20020084545 |
申请日期 |
2002.12.26 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
KIM, GYEONG MIN;OH, HUN JEONG |
分类号 |
H01L27/04;(IPC1-7):H01L27/04 |
主分类号 |
H01L27/04 |
代理机构 |
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地址 |
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